polish-gemstone
Acerca de
Esta habilidad proporciona una guía paso a paso para pulir piedras preformadas (tanto cabujones como tallas facetadas) hasta conseguir un acabado óptico final. Ayuda a seleccionar abrasivos y platillos/materiales de pulido apropiados según el tipo de gema, y aborda problemas comunes del pulido como piel de naranja, veladuras o arañazos. Úsala cuando una piedra esté lista para pulir, al elegir materiales de pulido o al repulir una superficie dañada.
Instalación rápida
Claude Code
Recomendadonpx skills add pjt222/agent-almanac -a claude-code/plugin add https://github.com/pjt222/agent-almanacgit clone https://github.com/pjt222/agent-almanac.git ~/.claude/skills/polish-gemstoneCopia y pega este comando en Claude Code para instalar esta habilidad
Documentación
磨寶石
以漸進磨料序、宜磨料、正確磨盤或墊,磨切之寶石至終光學質之光,適弧面石與刻面石。
用時
- 弧面或刻面石已過切階段、待磨
- 需為某種寶石擇正確磨料與磨盤
- 解磨不至全光(橙皮、霧、刮痕)
- 欲重磨既石表面磨損或刮痕者
入
- 必要:待磨之切寶石(弧面已成圓頂並順、或刻面石諸面皆切)
- 必要:種識(磨料與磨盤之擇依材)
- 可選:附磨輪/墊之切磨機(弧面)
- 可選:附磨盤之刻面機(刻面石)
- 可選:磨料:氧化鈰、氧化鋁、金剛石膏(諸微米級)、氧化錫、氧化鉻
- 可選:磨盤:錫、銅、陶瓷、Batt(合成)、BATT 盤、Corian、Lucite、皮、毛氈
- 可選:10x 放大鏡或寶石顯微鏡為質檢
法
第一步:表面備
確石之表面自切階段適備。
Pre-Polish Surface Check:
+--------------------+------------------------------------------+
| Check | Requirement |
+--------------------+------------------------------------------+
| Previous grit | All scratches from the cutting stage |
| scratches | must be removed by the final grit |
| | (typically 1200 or 3000) |
+--------------------+------------------------------------------+
| Surface uniformity | No flat spots on cabochons, no uneven |
| | facets on faceted stones |
+--------------------+------------------------------------------+
| Cleanliness | Stone thoroughly cleaned between grits |
| | and before polishing. Grit contamination |
| | is the #1 cause of polish failure |
+--------------------+------------------------------------------+
| Dop security | Stone securely dopped — shifting during |
| | polish destroys facet geometry |
+--------------------+------------------------------------------+
- 於 10x 放下察石
- 覓切砂之餘刮痕——其現為平行之線
- 若刮痕餘,磨前返宜砂階
- 徹清石:超聲波清潔器,或以洗潔精與水刷
- 清手、dop、與工區——砂污易轉
得:預磨砂級之無痕表,徹清,固 dop。表面當指甲覺玻璃般順。
敗則:若於細砂反覆磨後刮痕仍存,石或有方向硬(剛玉與藍晶常見)。試易磨向。若污為因,皆清並換水。
第二步:預磨序(弧面)
弧面石者,行諸預磨砂階。
Cabochon Pre-Polish Sequence:
+------+-----------+------------------------------------------+
| Stage| Grit | Purpose |
+------+-----------+------------------------------------------+
| 1 | 220 | Shape and dome (cutting stage — done) |
+------+-----------+------------------------------------------+
| 2 | 600 | Remove 220 scratches, refine shape |
+------+-----------+------------------------------------------+
| 3 | 1200 | Remove 600 scratches, smooth surface |
+------+-----------+------------------------------------------+
| 4 | 3000 | Remove 1200 scratches (optional but |
| | (or 1500) | recommended for hard stones like agate) |
+------+-----------+------------------------------------------+
| 5 | 8000 | Pre-polish (some machines include this) |
| | (or 14000)| Fine diamond paste on appropriate pad |
+------+-----------+------------------------------------------+
TIME PER GRIT: Spend equal time at each stage. Rushing a grit
stage means scratches carry forward and become visible after
polishing. A typical cabochon takes 3-5 minutes per grit stage.
- 諸砂階依序——勿略砂
- 各階放下察石,確前砂之刮痕皆除而後進
- 砂間徹清石與手
- 全表面持均壓與動
- 持水流防熱積
得:完預磨序後,石當有均之緞面,無 10x 下可見之刮痕。
敗則:若某砂階刮痕存,續行該砂——勿進。若深刮不出,退一砂階重磨。粗砂之污為持續刮痕之最常因。
第三步:磨料與磨盤之擇
為寶石種擇正確之磨料與磨盤。
Polishing Compound Guide:
+-------------------+------------------------------------------+
| Compound | Best For |
+-------------------+------------------------------------------+
| Cerium oxide | Quartz family (agate, jasper, amethyst, |
| | chalcedony), feldspar, obsidian |
| | Mix: paste consistency with water |
| | Lap/pad: leather, felt, or Batt |
+-------------------+------------------------------------------+
| Diamond paste | Universal — works on everything |
| (50,000 mesh / | Essential for corundum, spinel, topaz, |
| 0.25-0.5 micron) | garnet, and other hard stones |
| | Lap: tin, copper, ceramic, Corian |
+-------------------+------------------------------------------+
| Aluminum oxide | Corundum (ruby, sapphire), spinel, |
| (0.3 micron) | chrysoberyl |
| | Lap: ceramic, tin, wax |
+-------------------+------------------------------------------+
| Tin oxide | Quartz varieties, opal (gentle polish) |
| | Lap: leather, felt, Lucite |
+-------------------+------------------------------------------+
| Chromium oxide | Jade (jadeite, nephrite), emerald |
| (green compound) | Lap: leather |
+-------------------+------------------------------------------+
| Linde A | Corundum, spinel — traditional choice |
| (aluminum oxide) | Lap: wax, ceramic, tin |
+-------------------+------------------------------------------+
Polishing Lap Guide (Faceted Stones):
+-------------------+------------------------------------------+
| Lap Material | Use |
+-------------------+------------------------------------------+
| Tin (type metal) | General-purpose polish lap. Good for |
| | most stones with diamond or alumina |
+-------------------+------------------------------------------+
| Copper | Diamond polish for hard stones |
| | (corundum, spinel, topaz) |
+-------------------+------------------------------------------+
| Ceramic (BATT, | Diamond polish. Forgiving, good for |
| Darkside, Last | beginners. Works on most materials |
| Lap) | |
+-------------------+------------------------------------------+
| Corian (solid | Oxide polishes. Good for quartz family |
| surface) | |
+-------------------+------------------------------------------+
| Lucite/Plexiglass | Oxide polish for quartz, softer stones |
+-------------------+------------------------------------------+
| Leather/felt | Cabochon polishing. Cerium oxide or |
| | tin oxide |
+-------------------+------------------------------------------+
- 配磨料於寶石種
- 擇宜磨盤或墊之材
- 未知或罕石者,金剛石膏於陶瓷盤為最穩之始擇
- 備磨料:氧化物以水調為薄膏;金剛石膏於盤少施
- 磨料於盤均施——過則致「橙皮」紋
得:配寶石種之磨料 + 磨盤之合。誤合費時且或致次優之終光。
敗則:若標磨料初次未產良光,試:(1) 異磨盤材、(2) 細磨料級、或 (3) 減壓。某石對磨速敏——試低 rpm。皆敗者,金剛石膏於錫或陶瓷可用於幾乎任材。
第四步:終磨
執磨之程。
Polishing Technique:
CABOCHON POLISHING:
1. Apply compound to the leather/felt wheel
2. Run the wheel at moderate speed (lower than grinding)
3. Hold the stone lightly — REDUCE pressure compared to grinding
4. Move the stone across the wheel surface with gentle sweeping motion
5. Polish for 2-5 minutes, checking progress with a loupe
6. Add compound sparingly — too much creates orange peel
FACETED STONE POLISHING:
1. Charge the polishing lap with compound
2. Set the SAME angle as the cutting stage for each facet tier
3. Lower the stone gently onto the spinning lap
4. Polish each facet with light, consistent pressure
5. Check each facet under a loupe before moving to the next
6. Re-charge the lap periodically but do not over-charge
SPEED AND PRESSURE:
- Polishing speed: 50-75% of cutting speed
- Pressure: LIGHT — let the compound do the work
- Heavy pressure causes heat, orange peel, and facet rounding
- On faceted stones, heavy pressure rounds facet edges ("soft meets")
- 施磨料於盤/墊
- 設正角(刻面)或持圓頂角(弧面)
- 以輕均壓磨
- 每 1-2 分察進度於 10x 放
- 續至表現全光無餘刮痕
- 終洗:徹清石以除諸磨料殘
得:完磨之表,鏡光(刻面石)或深均光(弧面)。10x 放下無可見刮痕。刻面邊銳,會脆。
敗則:常見磨之問題與解:
- 橙皮(紋表):磨料過、壓過、或盤污。清盤並少施磨料
- 持續刮痕:粗砂之污。皆清,察磨料污,重磨
- 軟會(圓刻面邊):壓過。減壓並用較硬之盤
- 霧(無全光):磨料不配材、或磨料過乾。試異磨料或加水/延展劑
第五步:質評
於放下察成石。
Final Quality Checklist:
+--------------------+------------------------------------------+
| Criterion | Standard |
+--------------------+------------------------------------------+
| Lustre | Full, even lustre across all surfaces |
| | No dull patches or haze |
+--------------------+------------------------------------------+
| Scratches | None visible under 10x magnification |
| | Check under multiple light angles |
+--------------------+------------------------------------------+
| Orange peel | None — surface should be optically flat |
| | on each facet / smoothly curved on cabs |
+--------------------+------------------------------------------+
| Facet edges | Sharp and well-defined (faceted stones) |
| (faceted) | No rounding or "soft meets" |
+--------------------+------------------------------------------+
| Dome uniformity | Smooth, even curvature (cabochons) |
| (cabochons) | No flat spots or high points |
+--------------------+------------------------------------------+
| Cleanliness | All compound residue removed |
| | Stone cleaned ultrasonically or by hand |
+--------------------+------------------------------------------+
- 徹清石——餘磨料可仿磨光
- 於亮、定向光下多角察
- 用 10x 放察餘刮痕
- 刻面石:各面別察並驗會精
- 弧面:驗圓頂反一單未扭之光點(「光返試」)
- 記終重與尺
得:專業質磨之寶石——全光、10x 下無可見刮痕、刻面邊銳或圓頂順、清無餘殘。可鑲、展、售。
敗則:若特定區檢敗,可單面點磨(刻面石)或返磨輪於特定區(弧面)。除非廣布之缺,勿全石重磨。
驗
- 預磨表面磨前無刮痕
- 各砂階間石與具皆清
- 為寶石種擇正確磨料
- 用宜磨盤或墊材
- 磨之全程持輕壓
- 終檢 10x 下無可見刮痕
- 諸表皆達全光
- 刻面邊銳(刻面)或圓頂順(弧面)
- 終洗除諸磨料殘
陷
- 砂污:磨敗之最常單因。一粒 220 砂於磨盤致深刮痕。各階間執著清之
- 過壓:重壓生熱(可裂石)、致橙皮紋、圓刻面邊。讓磨料行其工——壓僅略多於石本重
- 過磨料:過載盤致漿層產橙皮而非平光。少施磨料並週期重充而非載盤
- 誤種磨料:氧化鈰於石英佳而於剛玉劣。金剛石膏於諸物皆作然貴。配磨料與石
- 略察:宣磨成前常於 10x 下察。肉眼不見之缺,鑲飾或買者察時即顯
參
cut-gemstone— 切階段必先磨善為之;切時帶之刮痕磨時不能單獨修appraise-gemstone— 磨質直接影響寶石評之「切」級,尤光輝與表面終光之評
Repositorio GitHub
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